Iigesi ezikhethekileyo
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I-Sulfur Tetrafluoride (SF4)
Inombolo ye-EINECS: 232-013-4
INOMBOLO YE-CAS: 7783-60-0 -
I-Nitrous Oxide (N2O)
I-nitrous oxide, eyaziwa ngokuba yi-laughing gas, yikhemikhali eyingozi enefomyula yekhemikhali i-N2O. Yigesi engenambala, enevumba elimnandi. I-N2O yi-oxidant enokuxhasa ukutsha phantsi kweemeko ezithile, kodwa izinzile kubushushu begumbi kwaye inefuthe elincinci lokudambisa iintlungu. , kwaye inokwenza abantu bahleke. -
I-Carbon Tetrafluoride (CF4)
I-Carbon tetrafluoride, ekwaziwa ngokuba yi-tetrafluoromethane, yigesi engenambala kubushushu obuqhelekileyo kunye noxinzelelo, ayinyibiliki emanzini. Igesi ye-CF4 okwangoku yeyona gesi isetyenziswa kakhulu ekutshiseni i-plasma kwishishini le-microelectronics. Ikwasetyenziswa njengegesi yelaser, i-cryogenic refrigerant, i-solvent, i-lubricant, i-insulating material, kunye ne-coolant kwiityhubhu ze-infrared detector. -
I-Sulfuryl Fluoride (F2O2S)
I-Sulfuryl fluoride SO2F2, igesi enobuthi, isetyenziswa kakhulu njengesibulali-zinambuzane. Ngenxa yokuba i-sulfuryl fluoride ineempawu zokusasazeka ngamandla kunye nokungangeni kwamanzi, isibulali-zinambuzane esibanzi, idosi ephantsi, isixa esisezantsi esiseleyo, isantya esikhawulezayo sokubulala izinambuzane, ixesha elifutshane lokusasazeka kwegesi, ukusetyenziswa okulula kubushushu obuphantsi, akukho mpembelelo kwisantya sokuhluma kunye nobuthi obuphantsi, kokukhona isetyenziswa kakhulu kwiindawo zokugcina impahla, kwiinqanawa zemithwalo, kwizakhiwo, kumadama okugcina amanzi, ekuthinteleni iintubi, njl.njl. -
ISilane (SiH4)
I-Silane SiH4 yigesi engenambala, inetyhefu kwaye isebenza kakhulu kwiqondo lobushushu eliqhelekileyo kunye noxinzelelo. I-Silane isetyenziswa kakhulu ekukhuleni kwe-epitaxial ye-silicon, izinto eziluhlaza ze-polysilicon, i-silicon oxide, i-silicon nitride, njl.njl., iiseli zelanga, iifayibha ze-optical, ukwenziwa kweglasi enemibala, kunye nokufakwa komphunga weekhemikhali. -
I-Octafluorocyclobutane (C4F8)
I-Octafluorocyclobutane C4F8, ubumsulwa begesi: 99.999%, isetyenziswa rhoqo njenge-aerosol propellant yokutya kunye negesi ephakathi. Isetyenziswa rhoqo kwinkqubo ye-semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), i-C4F8 isetyenziswa endaweni ye-CF4 okanye i-C2F6, isetyenziswa njengegesi yokucoca kunye negesi yokuqhekeza inkqubo ye-semiconductor. -
I-Nitric Oxide (NO)
Igesi ye-nitric oxide yi-compound ye-nitrogen enefomyula yekhemikhali i-NO. Yigesi engenambala, engenavumba, enetyhefu enganyibiliki emanzini. I-nitric oxide isabela kakhulu kwiikhemikhali kwaye isabela ne-oxygen ukuze yenze igesi ebolayo i-nitrogen dioxide (NO₂). -
IHydrogen Chloride (HCl)
I-Hydrogen chloride HCL Gas yigesi engenambala enevumba elibi. Isisombululo sayo samanzi sibizwa ngokuba yi-hydrochloric acid, ekwaziwa ngokuba yi-hydrochloric acid. I-Hydrogen chloride isetyenziswa kakhulu ekwenzeni iidayi, iziqholo, amayeza, ii-chloride ezahlukeneyo kunye nezithinteli zokubola. -
I-Hexafluoropropylene (C3F6)
I-hexafluoropropylene, ifomula yekhemikhali: C3F6, yigesi engenambala kubushushu obuqhelekileyo kunye noxinzelelo. Isetyenziswa kakhulu ekulungiseleleni iimveliso ezahlukeneyo zeekhemikhali ezincinci ezine-fluorine, izinto zokuxuba amayeza, izinto zokucima umlilo, njl.njl., kwaye ingasetyenziselwa ukulungiselela izixhobo zepolymer ezine-fluorine. -
I-Ammonia (NH3)
I-ammonia engamanzi / i-ammonia engenamanzi sisixhobo esibalulekileyo sekhemikhali esineendlela ezahlukeneyo zokusetyenziswa. I-ammonia engamanzi ingasetyenziswa njengesiqandisi. Isetyenziswa kakhulu ukuvelisa i-nitric acid, i-urea kunye nezinye izichumisi zeekhemikhali, kwaye ingasetyenziswa njengesixhobo esiluhlaza samayeza kunye nezibulali-zinambuzane. Kwishishini lokhuselo, isetyenziselwa ukwenza iipropellant zeerokethi kunye neerokethi.
