Iigesi ezikhethekileyo
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I-Sulfur Tetrafluoride (SF4)
I-EINECS NO: 232-013-4
CAS NO: 7783-60-0 -
Nitrous oxide (N2O)
I-nitrous oxide, eyaziwa ngokuba yigesi ehlekayo, yikhemikhali eyingozi ene-chemical formula N2O. Yigesi engenambala, enevumba elimnandi. I-N2O yi-oxidant enokuxhasa ukutsha phantsi kweemeko ezithile, kodwa izinzile kwiqondo lokushisa elingaphakathi kwaye inempembelelo encinci ye-anesthetic. , kwaye inokwenza abantu bahleke. -
ICarbon Tetrafluoride (CF4)
ICarbon tetrafluoride, ekwabizwa ngokuba yitetrafluoromethane, yigesi engenambala kubushushu obuqhelekileyo kunye noxinzelelo, enganyibilikiyo emanzini. Irhasi yeCF4 ngoku yeyona gas isetyenziswa kakhulu kwiplasma etching kushishino lwemicroelectronics. Ikwasetyenziswa njengerhasi yelaser, cryogenic refrigerant, solvent, lubricant, insulating material, kunye nesipholisi setyhubhu ye-infrared detector. -
I-Sulfuryl Fluoride (F2O2S)
I-Sulfuryl fluoride SO2F2, irhasi enetyhefu, isetyenziswa kakhulu njengesibulali zinambuzane. Ngenxa yokuba i-sulfuryl fluoride ineempawu zokusasazwa okunamandla kunye nokungena, i-insecticide ebanzi, idosi ephantsi, intsalela ephantsi, isantya esikhawulezayo sokubulala izinambuzane, ixesha elifutshane lokusasazeka kwerhasi, ukusetyenziswa ngokulula kwiqondo lobushushu eliphantsi, akukho siphumo kwisantya sokuntshula kunye netyhefu ephantsi, ngakumbi. Isetyenziswa ngokubanzi kwiindawo zokugcina iimpahla, iinqanawa zemithwalo, izakhiwo, amadama okugcina amanzi, ukuthintela iintubi, njl. -
I-Silane (SiH4)
I-Silane SiH4 yigesi engenambala, eyityhefu kwaye esebenza kakhulu ecinezelekileyo kubushushu obuqhelekileyo kunye noxinzelelo. I-Silane isetyenziswa kakhulu ekukhuleni kwe-epitaxial ye-silicon, imathiriyeli ekrwada ye-polysilicon, i-silicon oxide, i-silicon nitride, njl. -
I-Octafluorocyclobutane (C4F8)
I-Octafluorocyclobutane C4F8, ukucoceka kwegesi: 99.999%, ehlala isetyenziswa njengokutya kwe-aerosol propellant kunye negesi ephakathi. Ihlala isetyenziswa kwi-semiconductor PECVD (i-Plasma Enhance. Chemical Vapor deposition) inkqubo, i-C4F8 isetyenziselwa indawo ye-CF4 okanye i-C2F6, esetyenziselwa ukucoca igesi kunye nenkqubo ye-semiconductor etching gas. -
Nitric oxide (NO)
Igesi ye-nitric oxide yikhompawundi yenitrogen kunye nefomula yeekhemikhali NO. Yigesi engenambala, engenavumba, enetyhefu enganyibilikiyo emanzini. I-nitric oxide iyasebenza kakhulu ngokwekhemikhali kwaye idibana neoksijini yenze igesi eyonakalisayo initrogen dioxide (NO₂). -
IHydrogen Chloride (HCl)
IHydrogen chloride HCL Irhasi yigesi engenambala nevumba elibi. Isisombululo sayo samanzi sibizwa ngokuba yi-hydrochloric acid, eyaziwa ngokuba yi-hydrochloric acid. IHydrogen chloride isetyenziswa ikakhulu ukwenza idayi, iziqholo, amayeza, iikloridi ezahlukeneyo kunye ne-corrosion inhibitors. -
IHexafluoropropylene (C3F6)
I-Hexafluoropropylene, i-chemical formula: i-C3F6, igesi engenambala kwiqondo lokushisa eliqhelekileyo kunye noxinzelelo. Isetyenziswa kakhulu ekulungiseleleni iimveliso zekhemikhali ezintle ezine-fluorine, iziphakathi zamayeza, izixhobo zokucima umlilo, njl. -
I-Amoniya (NH3)
Ulwelo ammonia / anhydrous ammonia yimathiriyeli ekrwada ebalulekileyo yeekhemikhali ezinoluhlu olubanzi lwezicelo. I-ammonia yolwelo ingasetyenziswa njengefriji. Isetyenziselwa ikakhulu ukuvelisa i-nitric acid, iurea kunye nezinye izichumisi zekhemikhali, kwaye inokusetyenziswa njengemathiriyeli ekrwada yamayeza kunye nezitshabalalisi. Kwishishini lokhuselo, isetyenziselwa ukwenza iipropellants zeerokethi kunye nemijukujelwa.
