Iimveliso
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Ioksijini (O2)
Ioksijini yigesi engenambala nengenavumba. Yeyona ndlela ixhaphakileyo ye-oxygen. Ngokubhekiselele kwithekhnoloji, i-oksijini ikhutshwa kwinkqubo yokukhutshwa komoya, kwaye i-oksijini emoyeni ithatha malunga ne-21%. Ioksijini yigesi engenambala kwaye engenavumba kunye nefomula yeekhemikhali i-O2, eyona ndlela iqhelekileyo ye-oxygen elemental. Indawo yokunyibilika ngu-218.4°C, kwaye indawo yokubila yi-183°C. Ayinyibiliki lula emanzini. Malunga ne-30mL ye-oxygen inyibilika kwi-1L yamanzi, kwaye i-oksijeni engamanzi iluhlaza okwesibhakabhaka. -
I-Sulfur Dioxide (SO2)
I-sulphur dioxide (i-sulphur dioxide) yeyona ixhaphakileyo, ilula, kunye ne-sulphur oxide ecaphukisayo kunye ne-chemical formula SO2. I<em>sulphur dioxide yigesi engenambala neselubala nenevumba elinukayo. Inyibilika emanzini, i-ethanol kunye ne-ether, ulwelo lwesulfure dayoksayidi izinzile ngokwentelekiso, ayisebenzi, ayinakutsha, kwaye ayiwenzi umxube oqhumayo nomoya. I<em>sulphur dioxide ineempawu zokujija. I-sulphur dioxide idla ngokusetyenziswa kwishishini ukwenza iblich pulp, uboya, isilika, iminqwazi yeendiza, njl. -
I-Ethylene oxide (ETO)
I-ethylene oxide yenye yezona zilula ze-ethers ze-cyclic. Yikhompawundi ye-heterocyclic. Indlela yayo yeekhemikhali yiC2H4O. Iyi-carcinogen enetyhefu kunye nemveliso ebalulekileyo yepetrochemical. Iimpawu zeekhemikhali ze-ethylene oxide zisebenza kakhulu. Inokungena kwiimpendulo zokongezwa kweringi kunye neekhompawundi ezininzi kwaye inokunciphisa i-nitrate yesilivere. -
1,3 Butadiene (C4H6)
I-1,3-Butadiene i-organic compound kunye ne-chemical formula ye-C4H6. Yirhasi engenambala enevumba elimnandi kwaye kulula ukuyinyibilikisa. Inobuthi obuncinci kwaye ubuthi bayo bufana ne-ethylene, kodwa inomsindo onamandla kwesikhumba kunye ne-mucous membranes, kwaye inefuthe le-anesthetic kwiindawo eziphezulu. -
IHydrojeni (H2)
I-Hydrogen ine-formula yekhemikhali ye-H2 kunye ne-molecular weight ye-2.01588. Phantsi kobushushu obuqhelekileyo kunye noxinzelelo, yirhasi enokutsha ngokugqithisileyo, engenambala, ebonakalayo, engenavumba nengenancasa ekunzima ukuyinyibilikisa emanzini, kwaye ayisebenzi kwizinto ezininzi. -
I-Neon (Ne)
I-Neon yirhasi engenambala, engenavumba, engatshiyo enqabileyo enemichiza ye-Ne. Ngokwesiqhelo, i-neon inokusetyenziswa njengerhasi yokuzalisa izibane ezinemibala ye-neon kwimiboniso yentengiso yangaphandle, kwaye ingasetyenziselwa izikhombisi zokukhanya okubonakalayo kunye nolawulo lombane. Kwaye i-laser gas mix components. Iigesi ezintle ezifana ne-Neon, Krypton kunye ne-Xenon nazo zingasetyenziselwa ukuzalisa iimveliso zeglasi ukuphucula ukusebenza kwazo okanye ukusebenza kwazo. -
ICarbon Tetrafluoride (CF4)
ICarbon tetrafluoride, ekwabizwa ngokuba yitetrafluoromethane, yigesi engenambala kubushushu obuqhelekileyo kunye noxinzelelo, enganyibilikiyo emanzini. Irhasi yeCF4 ngoku yeyona gas isetyenziswa kakhulu kwiplasma etching kushishino lwemicroelectronics. Ikwasetyenziswa njengerhasi yelaser, cryogenic refrigerant, solvent, lubricant, insulating material, kunye nesipholisi setyhubhu ye-infrared detector. -
I-Sulfuryl Fluoride (F2O2S)
I-Sulfuryl fluoride SO2F2, irhasi enetyhefu, isetyenziswa kakhulu njengesibulali zinambuzane. Ngenxa yokuba i-sulfuryl fluoride ineempawu zokusasazwa okunamandla kunye nokungena, i-insecticide ebanzi, idosi ephantsi, intsalela ephantsi, isantya esikhawulezayo sokubulala izinambuzane, ixesha elifutshane lokusasazeka kwerhasi, ukusetyenziswa ngokulula kwiqondo lobushushu eliphantsi, akukho siphumo kwisantya sokuntshula kunye netyhefu ephantsi, ngakumbi. Isetyenziswa ngokubanzi kwiindawo zokugcina iimpahla, iinqanawa zemithwalo, izakhiwo, amadama okugcina amanzi, ukuthintela iintubi, njl. -
I-Silane (SiH4)
I-Silane SiH4 yigesi engenambala, eyityhefu kwaye esebenza kakhulu ecinezelekileyo kubushushu obuqhelekileyo kunye noxinzelelo. I-Silane isetyenziswa kakhulu ekukhuleni kwe-epitaxial ye-silicon, imathiriyeli ekrwada ye-polysilicon, i-silicon oxide, i-silicon nitride, njl. -
I-Octafluorocyclobutane (C4F8)
I-Octafluorocyclobutane C4F8, ukucoceka kwegesi: 99.999%, ehlala isetyenziswa njengokutya kwe-aerosol propellant kunye negesi ephakathi. Ihlala isetyenziswa kwi-semiconductor PECVD (i-Plasma Enhance. Chemical Vapor deposition) inkqubo, i-C4F8 isetyenziselwa indawo ye-CF4 okanye i-C2F6, esetyenziselwa ukucoca igesi kunye nenkqubo ye-semiconductor etching gas. -
Nitric oxide (NO)
Igesi ye-nitric oxide yikhompawundi yenitrogen kunye nefomula yeekhemikhali NO. Yigesi engenambala, engenavumba, enetyhefu enganyibilikiyo emanzini. I-nitric oxide iyasebenza kakhulu ngokwekhemikhali kwaye idibana neoksijini yenze igesi eyonakalisayo initrogen dioxide (NO₂). -
IHydrogen Chloride (HCl)
IHydrogen chloride HCL Irhasi yigesi engenambala nevumba elibi. Isisombululo sayo samanzi sibizwa ngokuba yi-hydrochloric acid, eyaziwa ngokuba yi-hydrochloric acid. IHydrogen chloride isetyenziswa ikakhulu ukwenza idayi, iziqholo, amayeza, iikloridi ezahlukeneyo kunye ne-corrosion inhibitors.
