Esona sixa sikhulu seGesi eKhethekileyo yoMbane – iNitrogen Trifluoride NF3

Ishishini lelizwe lethu le-semiconductor kunye neshishini lephaneli ligcina inqanaba eliphezulu lokuchuma. I-Nitrogen trifluoride, njengeyona gesi iyimfuneko kunye neyona volumu inkulu ekhethekileyo yombane ekuveliseni nasekusetyenzweni kweephaneli kunye nee-semiconductors, inendawo yokuthengisa ebanzi.

Isetyenziswa ngokuqhelekileyo i-fluorine-equlethe iigesi ezikhethekileyo ze-elektroniki ziqukaisulfure hexafluoride (SF6)i-tungsten hexafluoride (WF6),carbon tetrafluoride (CF4), i-trifluoromethane (CHF3), i-nitrogen trifluoride (NF3), i-hexafluoroethane (C2F6) kunye ne-octafluoropropane (C3F8). I-Nitrogen trifluoride (NF3) isetyenziswa ikakhulu njengomthombo we-fluorine we-hydrogen fluoride-fluoride igesi ephezulu yamandla e-laser yemichiza. Inxalenye esebenzayo (malunga ne-25%) ye-reaction energy phakathi kwe-H2-O2 kunye ne-F2 inokukhutshwa yi-laser radiation, ngoko ke ii-laser ze-HF-OF zezona zithembisayo phakathi kwee-laser zekhemikhali.

I-Nitrogen trifluoride yigesi egqwesileyo kwiplasma etching kushishino lwe-microelectronics. Kwi-silicon ye-etching kunye ne-silicon nitride, i-nitrogen trifluoride inezinga eliphezulu lokuchopha kunye nokukhetha kune-carbon tetrafluoride kunye nomxube we-carbon tetrafluoride kunye ne-oxygen, kwaye ayinangcoliseko phezulu. Ngokukodwa kwi-etching yezinto ezidityanisiweyo zesekethe ezinobunzima obungaphantsi kwe-1.5um, i-nitrogen trifluoride inezinga eliphezulu kakhulu lokulinganisa kunye nokukhetha, ukushiya kungabikho ntsalela phezu kwento edibeneyo, kwaye ikwayi-arhente yokucoca kakuhle kakhulu. Ngophuhliso lwe-nanotechnology kunye nophuhliso olukhulu lweshishini lombane, imfuno yalo iya kwanda imihla ngemihla.

Njengodidi lwegesi ekhethekileyo equlethe i-fluorine, i-nitrogen trifluoride (NF3) yeyona mveliso yegesi ekhethekileyo yombane kwimarike. Isebenza ngeekhemikhali kwiqondo lobushushu begumbi, iyasebenza ngakumbi kuneoksijini, izinzile kunefluorine, kwaye kulula ukuyiphatha kubushushu obuphezulu.

I-Nitrogen trifluoride isetyenziswa kakhulu njenge-plasma etching gas kunye ne-reaction arhente yokucoca igumbi, ilungele amasimi okuvelisa anje ngeechips ze-semiconductor, imiboniso yephaneli ecaba, iifiber zamehlo, iiseli ze-photovoltaic, njl.

Xa kuthelekiswa nezinye iigesi ze-elektroniki ezinefluorine, initrogen trifluoride ineengenelo zokusabela ngokukhawuleza kunye nokusebenza okuphezulu, ngakumbi kwi-etching yezinto ezine-silicon ezifana ne-silicon nitride, inezinga eliphezulu lokuchopha kunye nokukhetha, kungashiyi ntsalela kumphezulu wento egciniweyo, kwaye ikwayi-arhente yokucoca elungileyo, kwaye ayihlangani nenkqubo yokucoca.