Irhasi yeLaser

Irhasi yeLaser isetyenziswa ikakhulu kwilaser annealing kunye nerhasi yelithography kushishino lombane. Ukuxhamla kwi-innovation yezikrini zeefowuni eziphathwayo kunye nokwandiswa kweendawo zokusetyenziswa, umlinganiselo wemarike yepolysilicon yobushushu obuphantsi uya kwandiswa ngakumbi, kwaye inkqubo ye-laser annealing iphucule kakhulu ukusebenza kwee-TFTs. Phakathi kwe-neon, i-fluorine, kunye neegesi ze-argon ezisetyenziswa kwi-ArF excimer laser yokuvelisa i-semiconductors, i-akhawunti ye-neon ingaphezulu kwe-96% yomxube wegesi ye-laser. Ngokucokiswa kwetekhnoloji ye-semiconductor, ukusetyenziswa kwe-laser ye-excimer kunyukile, kwaye ukwaziswa kwetekhnoloji yokuvezwa kabini kukhokelele ekwenyukeni okubukhali kwemfuno yegesi ye-neon esetyenziswa yi-ArF excimer lasers. Ukuzuza ekukhuthazeni ukuhanjiswa kweegesi ezikhethekileyo ze-elektroniki, abavelisi basekhaya baya kuba nendawo engcono yokukhula kweemarike kwixesha elizayo.

Umatshini weLithography sesona sixhobo siphambili sokwenziwa kwe-semiconductor. I-Lithography ichaza ubungakanani beetransistors. Uphuhliso olulungelelanisiweyo lwekhonkco loshishino lwe-lithography lungundoqo ekuphumeleleni komatshini we-lithography. Izinto ezihambelanayo ze-semiconductor ezifana ne-photoresist, igesi yefotolithography, i-photomask, kunye nokugquma kunye nokuphuhlisa izixhobo zinomxholo ophezulu wezobuchwepheshe. Irhasi ye-Lithography yigesi eyenziwa ngumatshini we-lithography enzulu ye-ultraviolet laser. Iigesi ezahlukeneyo ze-lithography zinokuvelisa imithombo yokukhanya yamaza ahlukeneyo, kwaye ubude bawo buchaphazela ngokuthe ngqo isisombululo somatshini we-lithography, ongomnye we-cores yomatshini we-lithography. Ngo-2020, ukuthengiswa kwehlabathi jikelele koomatshini be-lithography kuya kuba ngamayunithi angama-413, apho i-ASML ithengisa iiyunithi ezingama-258 zibalwa kwi-62%, i-Canon yokuthengisa iiyunithi ze-122 zibalelwa kwi-30%, kwaye i-Nikon yokuthengisa iiyunithi ze-33 zibalelwa kwi-8%.