I-Boron trichloride (BCl3)yi-inorganic compound esetyenziswa kakhulu kwiinkqubo ze-dry etching kunye ne-chemical vapor deposition (CVD) kwimveliso ye-semiconductor. Yigesi engenambala enevumba elibi kakhulu kubushushu begumbi kwaye inovelwano emoyeni ofumileyo kuba iyanyibilika ukuze ivelise i-hydrochloric acid kunye ne-boric acid.

Ukusetyenziswa kweBoron Trichloride

Kwishishini le-semiconductor,I-Boron trichlorideIsetyenziswa kakhulu ekukroleni i-aluminiyam eyomileyo kwaye njenge-dopant yokwenza iindawo ze-P-type kwii-silicon wafers. Ingasetyenziselwa ukukrola izinto ezifana neGaAs, Si, AlN, kwaye njengomthombo we-boron kwizicelo ezithile. Ukongeza, i-Boron trichloride isetyenziswa kakhulu ekucubungulweni kwesinyithi, kushishino lweglasi, kuhlalutyo lweekhemikhali nakuphando lwelebhu.

Ukhuseleko lweBoron Trichloride

I-Boron trichlorideiyatsha kwaye inetyhefu kwaye inokubangela umonakalo omkhulu emehlweni naselusu. Iyanyibilika emoyeni ofumileyo ukuze ikhuphe igesi ye-hydrogen chloride enetyhefu. Ke ngoko, kufuneka kuthathwe amanyathelo okhuseleko afanelekileyo xa kusetyenziswaI-Boron trichloride, kuquka ukunxiba impahla yokuzikhusela, iiglasi zokukhusela kunye nezixhobo zokukhusela ukuphefumla, kunye nokusebenza kwindawo enomoya ococekileyo.