IBoron trichloride (BCl3)yikhompawundi ye-inorganic edla ngokusetyenziswa kwi-etching eyomileyo kunye ne-chemical vapor deposition (CVD) iinkqubo kwi-semiconductor yokuvelisa. Yigesi engenambala nevumba elirhabaxa elibukhali kwiqondo lobushushu begumbi kwaye inovelwano kumoya ofumileyo ngenxa yokuba i-hydrolyzes ivelisa i-hydrochloric acid kunye ne-boric acid.

Ukusetyenziswa kweBoron Trichloride

Kwishishini le-semiconductor,IBoron trichlorideisetyenziselwa ikakhulu ukukrola okomileyo kwealuminiyam kwaye njenge dopant ukwenza imimandla yodidi lwe-P kwiziphaluka zesilicon. Ingasetyenziselwa ukukhwela izinto ezifana ne-GaAs, i-Si, i-AlN, kunye nomthombo we-boron kwizicelo ezithile. Ukongeza, i-Boron trichloride isetyenziswa ngokubanzi kwi-metal processing, ishishini leglasi, uhlalutyo lweekhemikhali kunye nophando lwebhubhoratri.

Ukhuseleko lweBoron Trichloride

IBoron trichlorideinomhlwa kwaye inetyhefu kwaye inokubangela umonakalo omkhulu emehlweni kunye nolusu. I-hydrolyzes emoyeni ofumileyo ukukhupha igesi eyityhefu yehydrogen chloride. Ngoko ke, amanyathelo afanelekileyo okhuseleko kufuneka athathwe xa uphathwaIBoron trichloride, kubandakanywa ukunxiba iimpahla zokukhusela, izibuko kunye nezixhobo zokukhusela ukuphefumla, kunye nokusebenza kwindawo enomoya omhle.