IBoron trichloride (BCl3)yikhompawundi ye-inorganic edla ngokusetyenziswa kwi-etching eyomileyo kunye ne-chemical vapor deposition (CVD) iinkqubo kwimveliso ye-semiconductor. Yigesi engenambala nevumba elirhabaxa elinamandla kubushushu begumbi kwaye inovelwano kumoya ofumileyo kuba i-hydrolyzes ivelisa i-hydrochloric acid kunye ne-boric acid.

Ukusetyenziswa kweBoron Trichloride

Kwishishini le-semiconductor,I-Boron trichlorideisetyenziselwa ikakhulu ukukrola okomileyo kwealuminiyam kwaye njenge dopant ukwenza imimandla yohlobo lwe-P kwiziqwenga zesilicon. Ingasetyenziselwa ukukhwela izinto ezifana ne-GaAs, i-Si, i-AlN, kunye nomthombo we-boron kwizicelo ezithile. Ukongeza, i-Boron trichloride isetyenziswa ngokubanzi kwi-metal processing, ishishini leglasi, uhlalutyo lweekhemikhali kunye nophando lwebhubhoratri.

Ukhuseleko lweBoron Trichloride

I-Boron trichlorideinomhlwa kwaye inetyhefu kwaye inokubangela umonakalo omkhulu emehlweni kunye nolusu. I-hydrolyzes emoyeni ofumileyo ukukhupha igesi eyityhefu yehydrogen chloride. Ngoko ke, amanyathelo afanelekileyo okhuseleko kufuneka athathwe xa uphathwaI-Boron trichloride, kubandakanywa ukunxiba iimpahla zokukhusela, izibuko kunye nezixhobo zokukhusela ukuphefumla, kunye nokusebenza kwindawo enomoya omhle.